Nanolab
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Chemical Contacts

Max Ho
maxho@seas.ucla.edu

You-Sheng Lin
yousheng@seas.ucla.edu

Chemical Training
Usage of certain chemicals requires a special training session. The training for these can be arranged through the equipment engineer and the lab manager.
Safety & MSDS Links
Chemicals

The following chemicals are provided by the Nanolab at no additional cost except where noted.

Requests to bring other chemicals into the lab should be made to Max Ho. Be sure to provide the appropriate MSDS sheets.

Acids

  • Hydrochloric Acid (HCl)
  • Sulphuric Acid (H2SO4)
  • Hydroflouric Acid (HF)
  • Nitric Acid (HNO3)
  • Buffered Oxide Etch 6:1 (HF:NH4OH)
  • Acetic Acid (CH3COOH)
  • Phosphoric Acid (H3PO4)
  • Hydrogen Peroxide (H2O2)

Bases

  • Potassium Hydroxide (KOH)
  • Ammonium Hydroxide (NH4OH)
  • Ammonium Fluoride (NH4F)

Evaporation Sources

  • Titanium
  • Chromium
  • Aluminum
  • Copper
  • Gold (user pays for amount used)
  • Platinum (user pays for amount used)

Sputter Sources

  • Titanium
  • Chromium
  • Aluminum
  • Copper
  • Nickel

Solvents

  • Isopropanol (C3H8O)
  • Methanol (CH3OH)
  • Acetone (C3H6O)

Photolithography Chemicals

  • AZ5214E IR Photoresist
  • AZ 4620 Photoresist
  • SU-8 2100 Photoresist (user pays for amount used)
  • AZ Developer
  • AZ 300 MIF Developer
  • AZ 400K Developer
  • SU-8 Developer
  • AZ 1500 Thinner
  • AZ 300T Striper
  • Aleg 355 stripper

 

Etching Solutions

  • Chromium Etchant (CR-7S)
  • Gold Etchant

Miscellaneous

  • Hexamethyldisilazane (HMDS)
  • Hydrogen Peroxide (H2O2)