Chemicals
The following chemicals are provided by the Nanolab at no additional cost except where noted.
Requests to bring other chemicals into the lab should be made to Max Ho. Be sure to provide the appropriate MSDS sheets.
Acids
- Hydrochloric Acid (HCl)
- Sulphuric Acid (H2SO4)
- Hydroflouric Acid (HF)
- Nitric Acid (HNO3)
- Buffered Oxide Etch 6:1 (HF:NH4OH)
- Acetic Acid (CH3COOH)
- Phosphoric Acid (H3PO4)
- Hydrogen Peroxide (H2O2)
Bases
- Potassium Hydroxide (KOH)
- Ammonium Hydroxide (NH4OH)
- Ammonium Fluoride (NH4F)
Evaporation Sources
- Titanium
- Chromium
- Aluminum
- Copper
- Gold (user pays for amount used)
- Platinum (user pays for amount used)
Sputter Sources
- Titanium
- Chromium
- Aluminum
- Copper
- Nickel
Solvents
- Isopropanol (C3H8O)
- Methanol (CH3OH)
- Acetone (C3H6O)
Photolithography Chemicals
- AZ5214E IR Photoresist
- AZ 4620 Photoresist
- SU-8 2100 Photoresist (user pays for amount used)
- AZ Developer
- AZ 300 MIF Developer
- AZ 400K Developer
- SU-8 Developer
- AZ 1500 Thinner
- AZ 300T Striper
- Aleg 355 stripper
Etching Solutions
- Chromium Etchant (CR-7S)
- Gold Etchant
Miscellaneous
- Hexamethyldisilazane (HMDS)
- Hydrogen Peroxide (H2O2)

