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Chemical Contacts

Max Ho

You-Sheng Lin

Chemical Training
Usage of certain chemicals requires a special training session. The training for these can be arranged through the equipment engineer and the lab manager.
Safety & MSDS Links

The following chemicals are provided by the Nanolab at no additional cost except where noted.

Requests to bring other chemicals into the lab should be made to Max Ho. Be sure to provide the appropriate MSDS sheets.


  • Hydrochloric Acid (HCl)
  • Sulphuric Acid (H2SO4)
  • Hydroflouric Acid (HF)
  • Nitric Acid (HNO3)
  • Buffered Oxide Etch 6:1 (HF:NH4OH)
  • Acetic Acid (CH3COOH)
  • Phosphoric Acid (H3PO4)
  • Hydrogen Peroxide (H2O2)


  • Potassium Hydroxide (KOH)
  • Ammonium Hydroxide (NH4OH)
  • Ammonium Fluoride (NH4F)

Evaporation Sources

  • Titanium
  • Chromium
  • Aluminum
  • Copper
  • Gold (user pays for amount used)
  • Platinum (user pays for amount used)

Sputter Sources

  • Titanium
  • Chromium
  • Aluminum
  • Copper
  • Nickel


  • Isopropanol (C3H8O)
  • Methanol (CH3OH)
  • Acetone (C3H6O)

Photolithography Chemicals

  • AZ5214E IR Photoresist
  • AZ 4620 Photoresist
  • SU-8 2100 Photoresist (user pays for amount used)
  • AZ Developer
  • AZ 300 MIF Developer
  • AZ 400K Developer
  • SU-8 Developer
  • AZ 1500 Thinner
  • AZ 300T Striper
  • Aleg 355 stripper


Etching Solutions

  • Chromium Etchant (CR-7S)
  • Gold Etchant


  • Hexamethyldisilazane (HMDS)
  • Hydrogen Peroxide (H2O2)