Equipment List
- Lithography
- Deposition
- CHA Mark 40 Evaporator
- CHA Solution E-Beam Evaporator
- Deposition Oxidation - Tystar Tytan 3600
- Deposition Oxidation - Tystar
- Deposition LPCVD Nitride Low Stress - Tystar
- Deposition LPCVD Tystar Titan II
- Deposition LPCVD Nitride/Poly/LTO
- Deposition LPCVD Nitride
- Deposition PECVD - Plasma Therm 790
- Deposition PECVD BMR Technology
- Deposition - CVC 601 Sputterer
- Denton Desk II Deposition Sputterer
- Denton Desk V Thin Film Deposition System
- Denton Discovery Sputterer
- Ultratech Fiji - Atomic Layer Deposition
- Polifab STS Multiplex CVD Deposition System
- Ultratech Savannah Atomic Layer Deposition
- SCS PDS 2010 Parylene Deposition
- Etching
- Plasma Therm SLR 770 ICP - Chloride Etcher
- STS AOE Advcanced Oxide Etcher
- HF Vapor Etcher
- Matrix 105
- Oxford Plasmalab 80 Plus
- Plasma Etch PE-100 Plasma System
- Plasma -Therm FDRIE DSE III
- Porous Si Etcher
- Technics Micro-RIE Series 800
- Tegal Plasmaline 515 Photoresist Asher
- Ulvac NE-550 Chlorine Etcher
- Ulvac NLD-570 Oxide Etcher
- Unaxis DRIE
- Xiatix Xenon Difluoride Etching System
- Measurement
- AST Goniometer
- CDE ResMap
- Dektak 6 Surface Profile Measuring System
- Vecco Dektak 8 Profilometer
- EDAX Genesis
- FEI Nova 600 Nanolab DualBeam SEM/FIB
- Hitachi S4700 SEM
- Jeol 7500F - Field Emission Scanning Electron Microscope
- Leica DM2500 Microscope
- M&M Probe Station
- Nanometrics Nanospec 210/2100 Thin Film Measuring System
- Measurment Microscopes
- Prometrix Omnimap RS35C
- SCI Filmtek 2000
- Sopra GES5 Elipsometer
- Tencor Flexus 2320A Stress Tester
- ULVAC UNECS-2000 Elipsometer
- Vecco Dektak 150 Surface Profiler
- Vecco Dilnnova Atomic Force Microscope
- Wyko NT3300 Optical Profiler
- Thermal
- Chemical
- Backend
- Miscellaneous
