NanoLabTop-tier technology made available to the UCLA community and beyond. Equipment Portfolio AllBackendChemicalDepositionEtchingLithographyMeasurementMiscellaneousThermal JEOL JSM-6610 Scanning Electron MicroscopeCNSI Site, Lithography Z-Test ToolEngineering Site, Miscellaneous YES LPIII HMDS Thermal OvenCNSI Site, Thermal Tystar Therm AnnealEngineering Site, Thermal PlasmaTherm SLR 770 ICP – Chlorine EtcherEngineering Site, Etching Deposition Oxidation – Tystar – Tube 1Deposition, Engineering Site Deposition Oxidation – Tystar Tytan 3600 – Tube 2CNSI Site, Deposition Deposition LPCVD Nitride Low Stress – Tystar -Tube 2Deposition, Engineering Site CHA Solution E-Beam EvaporatorCNSI Site, Deposition LogiTech CDPBackend, Engineering Site Chemical Wet Benches (CNSI)Chemical, CNSI Site ASML PAS 5500/200 – StepperCNSI Site, Lithography STS AOE Advanced Oxide EtcherEngineering Site, Etching AST GoniometerCNSI Site, Measurement Deposition PECVD – BMR TechnologyDeposition, Engineering Site Carbolite High Temperature OvenCNSI Site, Engineering Site, Thermal CDE ResMapEngineering Site, Measurement CHA Mark 40 Evaporator (old)Deposition, Engineering Site CHA Mark 40 Evaporator (new)Deposition, Engineering Site Deposition – CVC 601 SputtererDeposition, Engineering Site Dektak 6 Surface Profile Measuring SystemEngineering Site, Measurement Veeco Dektak 8 ProfilometerEngineering Site, Measurement Denton Desk II Deposition SputterDeposition, Engineering Site Denton Desk V Thin Film Deposition SystemCNSI Site, Deposition Denton Discovery SputtererDeposition, Engineering Site EDAX GenesisEngineering Site, Measurement FEI Nova 600 Nanolab DualBeam SEM/FIBEngineering Site, Measurement Ultratech Fiji – Atomic Layer DepositionDeposition, Engineering Site Fusion UV SystemsBackend, CNSI Site G&P Technology Poli 400LBackend, Engineering Site Headway Spin CoaterCNSI Site, Engineering Site, Lithography Heidelberg DWL 66 LaserWriterEngineering Site, Lithography HF Vapor EtcherEngineering Site, Etching HF-Buffered Oxide EtchEngineering Site, Lithography Hitachi S4700 SEMEngineering Site, Measurement Jeol 7500F – Field Emission Scanning Electron MicroscopeCNSI Site, Measurement Jelight UV CleanerBackend, CNSI Site Karl Suss MA6 AlignerCNSI Site, Engineering Site, Lithography Karl Suss SB8 Wafer BonderBackend, CNSI Site Leica DM2500 MicroscopeCNSI Site, Measurement Logitech PM5 Polisher/GrinderBackend, Engineering Site Loomis LSD-100Backend, CNSI Site Deposition LPCVD Tystar Titan II – Tube 4Deposition, Engineering Site Deposition LPCVD Nitride/Poly/LTODeposition, Engineering Site Deposition LPCVD Polysilicon – Tystar Tube 3Deposition, Engineering Site Deposition LPCVD Nitride – Tystar Tube 2Deposition, Engineering Site M&M probe stationCNSI Site, Engineering Site, Measurement Matrix 105CNSI Site, Engineering Site, Etching Modular Process Technology RTP 650Engineering Site, Thermal Modular Process Technology RTP-600xpCNSI Site, Thermal Nanometrics Nanospec 210/2100 Thin Film Measuring SystemCNSI Site, Engineering Site, Measurement Measurement MicroscopesCNSI Site, Engineering Site, Measurement Nitrogen-Purged Muffle FurnaceLithography Oxford Plasmalab 80 PlusCNSI Site, Etching Plasma Etch PE-100 Plasma SystemCNSI Site, Etching Plasma-Therm FDRIE DSE IIIEngineering Site, Etching Deposition PECVD – Plasma Therm 790Deposition, Engineering Site Polifab STS Multiplex CVD Deposition SystemDeposition, Engineering Site Porous Si EtcherEngineering Site, Etching Prometrix Omnimap RS35CCNSI Site, Measurement Ultratech Savannah Atomic Layer DepositionDeposition, Engineering Site SCI Filmtek 2000Engineering Site, Measurement SCS PDS 2010 Parylene DepositionCNSI Site, Deposition, Engineering Site SemiTool Spin Rinse DryerChemical, CNSI Site Sloan E-Beam EvaporatorDeposition, Engineering Site Sopra GES5 EllipsometerEngineering Site, Measurement SVG 8800 Track Coater & DeveloperCNSI Site, Lithography Technics Micro-RIE Series 800Engineering Site, Etching Tegal Plasmaline 515 Photoresist AsherEngineering Site, Etching Tencor Flexus 2320A Stress TesterEngineering Site, Measurement Tousimis 915B Critical Point DryerBackend, CNSI Site, Engineering Site Deposition Oxidation – Tystar Tytan 3600 – Tube 1CNSI Site, Deposition Ulvac JSP 8000 Metal Deposition SputterCNSI Site, Deposition Ulvac NE-550 Chlorine EtcherCNSI Site, Etching Ulvac NLD-570 Oxide EtcherEngineering Site, Etching ULVAC UNECS-2000 EllipsometerEngineering Site, Measurement Unaxis DRIEEngineering Site, Etching Veeco Dektak 150 Surface ProfilerCNSI Site, Measurement Veeco DiInnova Atomic Force MicroscopeCNSI Site, Measurement Raith EBPG 5000+ES – Electron Beam WriterCNSI Site, Lithography VWR-Vacuum OvenEngineering Site, Thermal Chemical Wet Benches (E-IV)Chemical, Engineering Site Wyko NT3300 Optical ProfilerEngineering Site, Measurement Xiatix Xenon Difluoride Etching SystemEngineering Site, Etching YES LPIII Vacuum OvenCNSI Site, Thermal
