Coronavirus information from UCLA and UCLA Health.

NanoLab

Top-tier technology made available to the UCLA community and beyond.

Equipment Portfolio

Z-Test Tool

Z-Test Tool

YES LPIII HMDS Thermal Oven

YES LPIII HMDS Thermal Oven

Tystar Therm Anneal

Tystar Therm Anneal

PlasmaTherm SLR 770 ICP – Chlorine Etcher

PlasmaTherm SLR 770 ICP – Chlorine Etcher

Deposition Oxidation – Tystar – Tube 1

Deposition Oxidation – Tystar – Tube 1

Deposition Oxidation – Tystar Tytan 3600 – Tube 2

Deposition Oxidation – Tystar Tytan 3600 – Tube 2

Deposition LPCVD Nitride Low Stress – Tystar -Tube 2

Deposition LPCVD Nitride Low Stress – Tystar -Tube 2

CHA Solution E-Beam Evaporator

CHA Solution E-Beam Evaporator

LogiTech CDP

LogiTech CDP

Chemical Wet Benches (CNSI)

Chemical Wet Benches (CNSI)

ASML PAS 5500/200 – Stepper

ASML PAS 5500/200 – Stepper

STS AOE Advanced Oxide Etcher

STS AOE Advanced Oxide Etcher

AST Goniometer

AST Goniometer

Deposition PECVD – BMR Technology

Deposition PECVD – BMR Technology

Carbolite High Temperature Oven

Carbolite High Temperature Oven

CDE ResMap

CDE ResMap

CHA Mark 40 Evaporator (old)

CHA Mark 40 Evaporator (old)

CHA Mark 40 Evaporator (new)

CHA Mark 40 Evaporator (new)

Deposition – CVC 601 Sputterer

Deposition – CVC 601 Sputterer

Dektak 6 Surface Profile Measuring System

Dektak 6 Surface Profile Measuring System

Veeco Dektak 8 Profilometer

Veeco Dektak 8 Profilometer

Denton Desk II Deposition Sputter

Denton Desk II Deposition Sputter

Denton Desk V Thin Film Deposition System

Denton Desk V Thin Film Deposition System

Denton Discovery Sputterer

Denton Discovery Sputterer

EDAX Genesis

EDAX Genesis

FEI Nova 600 Nanolab DualBeam SEM/FIB

FEI Nova 600 Nanolab DualBeam SEM/FIB

Ultratech Fiji – Atomic Layer Deposition

Ultratech Fiji – Atomic Layer Deposition

Fision UV Systems

Fision UV Systems

G&P Technology Poli 400L

G&P Technology Poli 400L

Headway Spin Coater

Headway Spin Coater

Heidelberg DWL 66 LaserWriter

Heidelberg DWL 66 LaserWriter

HF Vapor Etcher

HF Vapor Etcher

HF-Buffered Oxide Etch

HF-Buffered Oxide Etch

Hitachi S4700 SEM

Hitachi S4700 SEM

Jeol 6610 JSM – Field Emission Scanning Electron Microscope

Jeol 6610 JSM – Field Emission Scanning Electron Microscope

Karl Suss MA6 Aligner

Karl Suss MA6 Aligner

Karl Suss SB6 Wafer Bonder

Karl Suss SB6 Wafer Bonder

Leica DM2500 Microscope

Leica DM2500 Microscope

Logitech PM5 Polisher/Grinder

Logitech PM5 Polisher/Grinder

Loomis LSD-100

Loomis LSD-100

Deposition LPCVD Tystar Titan II – Tube 4

Deposition LPCVD Tystar Titan II – Tube 4

Deposition LPCVD Nitride/Poly/LTO

Deposition LPCVD Nitride/Poly/LTO

Deposition LPCVD Polysilicon – Tystar Tube 3

Deposition LPCVD Polysilicon – Tystar Tube 3

Deposition LPCVD Nitride – Tystar Tube 2

Deposition LPCVD Nitride – Tystar Tube 2

M&M probe station

M&M probe station

Matrix 105

Matrix 105

Modular Process Technology RTP 610

Modular Process Technology RTP 610

Modular Process Technology RTP-650

Modular Process Technology RTP-650

Nanometrics Nanospec 2100 Thin Film Measuring System

Nanometrics Nanospec 2100 Thin Film Measuring System

Measurement Microscopes

Measurement Microscopes

Nitrogen-Purged Muffle Furnace

Nitrogen-Purged Muffle Furnace

Optical Microscopes

Optical Microscopes

Oxford Plasmalab 80 Plus

Oxford Plasmalab 80 Plus

Plasma Etch PE-100 Plasma System

Plasma Etch PE-100 Plasma System

Plasma-Therm FDRIE DSE II

Plasma-Therm FDRIE DSE II

Deposition PECVD – Plasma Therm 790

Deposition PECVD – Plasma Therm 790

Porous Si Etcher

Porous Si Etcher

Prometrix Omnimap RS35C

Prometrix Omnimap RS35C

Ultratech Savannah Atomic Layer Deposition

Ultratech Savannah Atomic Layer Deposition

SCI Filmtek 2000

SCI Filmtek 2000

SCS PDS 2010  Parylene Deposition

SCS PDS 2010 Parylene Deposition

SemiTool Spin Rinse Dryer

SemiTool Spin Rinse Dryer

Sloan E-Beam Evaporator

Sloan E-Beam Evaporator

Sopra GES5 Ellipsometer

Sopra GES5 Ellipsometer

SVG 8800 Track Coater & Developer

SVG 8800 Track Coater & Developer

Technics Micro-RIE Series 800

Technics Micro-RIE Series 800

Tegal Plasmaline 515 Photoresist Asher

Tegal Plasmaline 515 Photoresist Asher

Tencor Flexus 2320A Stress Tester

Tencor Flexus 2320A Stress Tester

Tousimis 915B Critical Point Dryer

Tousimis 915B Critical Point Dryer

Deposition Oxidation – Tystar Tytan 3600 – Tube 1

Deposition Oxidation – Tystar Tytan 3600 – Tube 1

Ulvac JSP 8000 Metal Deposition Sputter

Ulvac JSP 8000 Metal Deposition Sputter

Ulvac NE 550 Chlorine Etcher

Ulvac NE 550 Chlorine Etcher

Ulvac NLD-570 Oxide Etcher

Ulvac NLD-570 Oxide Etcher

ULVAC UNECS-2000 Ellipsometer

ULVAC UNECS-2000 Ellipsometer

Unaxis DRIE

Unaxis DRIE

Veeco Dektak 150 Surface Profiler

Veeco Dektak 150 Surface Profiler

Veeco DiInnova Atomic Force Microscope

Veeco DiInnova Atomic Force Microscope

VEECO DI 3100 Atomic Force Microscope

VEECO DI 3100 Atomic Force Microscope

Vistec EBPG 5000+ES – Electron Beam Writer

Vistec EBPG 5000+ES – Electron Beam Writer

VWR-Vacuum Oven

VWR-Vacuum Oven

Chemical Wet Benches (E-IV)

Chemical Wet Benches (E-IV)

Wyko NT3300 Optical Profiler

Wyko NT3300 Optical Profiler

Xiatix Xenon Difluoride Etching System

Xiatix Xenon Difluoride Etching System

YES LPIII Vacuum Oven

YES LPIII Vacuum Oven