Chemicals
The following chemicals are provided in the NanoLab at no additional cost (unless noted)
Acids
- Hydrochloric Acid (HCl)
- Sulphuric Acid (H2SO4)
- Hydroflouric Acid (HF)
- Nitric Acid (HNO3)
- Buffered Oxide Etch 6:1 (HF:NH4OH)
- Acetic Acid (CH3COOH)
- Phosphoric Acid (H3PO4)
- Hydrogen Peroxide (H2O2)
Bases
- Potassium Hydroxide (KOH)
- Ammonium Hydroxide (NH4OH)
- Ammonium Fluoride (NH4F)
Evaporation Sources
- Titanium
- Chromium
- Aluminum
- Copper
- Gold (user pays for amount used)
- Platinum (user pays for amount used)
Sputter Sources
- Titanium
- Chromium
- Aluminum
- Copper
- Nickel
Solvents
- Isopropanol (C3H8O)
- Methanol (CH3OH)
- Acetone (C3H6O
Photolithography Chemicals
- AZ5214E IR Photoresist
- AZ 4620 Photoresist
- SU-8 2100 Photoresist (user pays for amount used)
- AZ Developer
- AZ 300 MIF Developer
- AZ 400K Developer
- SU-8 Developer
- AZ 1500 Thinner
- AZ 300T Striper
- Aleg 355 stripper
Etching Solutions
- Chromium Etchant (CR-7S)
- Gold Etchant
Miscellaneous
- Hexamethyldisilazane (HMDS)
- Hydrogen Peroxide (H2O2)
Additional Chemical Requests
Need additional chemicals brought into lab?
Contact Max Ho with the appropriate MSDS Sheets.
Chemical Training
Usage of certain chemicals requires a special training session. The training for these can be arranged through the equipment engineer and the lab manager.
- HF-BOE Training
- Standard operating procedures
- Chemical sign-off form