Coronavirus information from UCLA and UCLA Health.

Chemicals

The following chemicals are provided in the NanoLab at no additional cost (unless noted)

Acids

  • Hydrochloric Acid (HCl)
  • Sulphuric Acid (H2SO4)
  • Hydroflouric Acid (HF)
  • Nitric Acid (HNO3)
  • Buffered Oxide Etch 6:1 (HF:NH4OH)
  • Acetic Acid (CH3COOH)
  • Phosphoric Acid (H3PO4)
  • Hydrogen Peroxide (H2O2)

Bases

  • Potassium Hydroxide (KOH)
  • Ammonium Hydroxide (NH4OH)
  • Ammonium Fluoride (NH4F)

Evaporation Sources

  • Titanium
  • Chromium
  • Aluminum
  • Copper
  • Gold (user pays for amount used)
  • Platinum (user pays for amount used)

Sputter Sources

  • Titanium
  • Chromium
  • Aluminum
  • Copper
  • Nickel

Solvents

  • Isopropanol (C3H8O)
  • Methanol (CH3OH)
  • Acetone (C3H6O

Photolithography Chemicals

  • AZ5214E IR Photoresist
  • AZ 4620 Photoresist
  • SU-8 2100 Photoresist (user pays for amount used)
  • AZ Developer
  • AZ 300 MIF Developer
  • AZ 400K Developer
  • SU-8 Developer
  • AZ 1500 Thinner
  • AZ 300T Striper
  • Aleg 355 stripper

Etching Solutions

  • Chromium Etchant (CR-7S)
  • Gold Etchant

Miscellaneous

  • Hexamethyldisilazane (HMDS)
  • Hydrogen Peroxide (H2O2)

 

 

 

Additional Chemical Requests

Need additional chemicals brought into lab?

Contact Max Ho with the appropriate MSDS Sheets.

 

 

Chemical Training

Usage of certain chemicals requires a special training session. The training for these can be arranged through the equipment engineer and the lab manager.