Nova 600 SEM/FIB System

The NOVA 600 is a state-of-the-art nanofabrication tool used for TEM sample preparation, failure analyis applications and providing top-rate SEM imaging.

  • Nova 600 Specification (pdf)
  • 1.1 nm SEM resolution
  • 10 nm FIB resolution
  • Pt, W and C Deposition
  • 5-axis Stage with 150 nm Travel
  • Wafer Handling up to 6″
  • TEM Sample Preparation
  • Cross-Sectional Imaging
  • Nanoscale Patterning
  • Basic Circuit Ends
  • Material Deposition
  • High Resolution SEM Imaging
TEM Samples
  • Produced by NanoLab staff
  • Final thickness of about 50-100nm
  • Flat fee per sample
  • TEM grid and consumables included in fee
TEM Services

For TEM services, please contact the Electron Imaging Center for Nanomachines (EICN) at CNSI. 

Full Service Facility
  • Open to all academic and industry users. It is operated by highly skilled Nanolab engineers although training is available for frequent clients.
  • Account Autherization Form