NanoLab Equipment

Equipment Category – Deposition

CHA Solution E-Beam Evaporator

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The CHA Solution electron beam (E-Beam) evaporator process development system is a small-scale vacuum deposition system designed for small lot processing and engineered to handle a wide range of deposition needs. Its fully water cooled stainless steel chamber allows for flexibility in optimizing process start temperatures. Included in this system is CHA’s SmartSource electron beam gun with motor driven crucible rotation and lift lid. Neodymium magnets are used in the SmartSource gun for strength that is not compromised by repeated gun cleanings and turret changes. It features a unique, interlocking crucible cover that prevents cross-contamination of source materials between its pockets during evaporation. The entire system is monitored and controlled with PLC automation with touchscreen interface.

  • Electron Beam (E-Beam) thin metal film evaporation from up to 4 independent sources.
  • Metals available: Ti, Cr, Ni, NiFe, Al, Au, Ag, Pt, Cu, Nb, Gd, Co, Ge, Ag, Nb, Sn, W, Fe, TiN Ta, SiO2, NiO, TiO2, Al2O3, HfO2.
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