by mroseboro | Jan 31, 2020 |
NanoLab Equipment Equipment Category – Lithography ASML PAS 5500/200 – Stepper Location: CNSI Site | Back to Equipment >> Reserve equipment with labrunr The PAS 5500/350C is a Deep UV stepper for 0.15-μm applications and beyond. The high productivity...
by mroseboro | Jan 31, 2020 |
NanoLab Equipment Equipment Category – Measurement AST Goniometer Location: CNSI Site | Back to Equipment >> Reserve equipment with labrunr Wafer Surface Analysis Systems are specially designed for use in semiconductor wafer processing quality control. The...
by mroseboro | Jan 31, 2020 |
NanoLab Equipment UCLA Nanolab Equipment Category – Furnace/Thermal Carbolite High Temperature Oven Location: Engineering IV Site | Back to Equipment >> Reserve equipment with LabRunr Location: CNSI Site | Back to Equipment >> Reserve equipment with...
by mroseboro | Jan 31, 2020 |
NanoLab Equipment Equipment Category – Deposition Denton Desk V Location: CNSI Site | Back to Equipment >> Reserve equipment with labrunr The Desk V Sample Preparation system, equipped for both evaporation and sputtering, is a high productivity thin film...
by mroseboro | Jan 31, 2020 |
NanoLab Equipment Equipment Category – Backend Fusion UV Systems LC6B Benchtop Conveyor Location: CNSI Site | Back to Equipment >> Reserve equipment with labrunr Ideal for small production parts, the LC6B benchtop UV conveyor can handle substrates up to...
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