by mroseboro | May 20, 2020 |
NanoLab Equipment Equipment Category – Thermal YES LPIII HMDS Thermal Oven Location: CNSI Site | Back to Equipment >> Reserve equipment with labrunr The YES Oven can be used to anneal samples up to 450° C in ambient atmosphere, vacuum, or with the user’s...
by mroseboro | May 20, 2020 |
NanoLab Equipment Equipment Category – Thermal Tystar Therm Anneal Location: Engineering IV Site | Back to Equipment >> Reserve equipment with LabRunr Description coming soon: Additional Information Tom Leeleet@seas.ucla.edu310.206.4641Brian...
by mroseboro | Jan 31, 2020 |
NanoLab Equipment UCLA Nanolab Equipment Category – Furnace/Thermal Carbolite High Temperature Oven Location: Engineering IV Site | Back to Equipment >> Reserve equipment with LabRunr Location: CNSI Site | Back to Equipment >> Reserve equipment with...
by mroseboro | Jan 31, 2020 |
NanoLab Equipment Equipment Category – Thermal Modular Process Technology RTP-650 Location: Engineering IV Site | Back to Equipment >> Reserve equipment with LabRunr The RTP 610 is a rapid thermal annealer which uses 2 banks of tungsten-halogen lamps to...
by kbair | Jan 31, 2020 |
NanoLab Equipment Equipment Category – Furnace Modular Process Technology RTP-600xp Location: CNSI Site | Back to Equipment >> Reserve equipment with LabRunr The RTP-600xp is a rapid thermal processing system dedicating for III-V ohmic contact annealing...
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