The innovative CHA Mark 40 Evaporators signify a breakthrough in vacuum deposition systems. The Mark 40 machines can accomodate a large variety of deposition equipment including versatile combinations of deposition sources and substrates fixturing to address virtually any application.

Features

• SECS/GEM and CE compliant.
• 1,000 L/Sec. pumping speed for water vapor and other condensable gases in the process chamber.
• Dual Operation, Sputtering and Evaporation.
• Exceptional Film Uniformity (Fixture Dependent).
• Processes round cathodes, electron beams, substrate heating, plasma texturing & etching and ion texturing & etching.
• Process chamber is easy-to-access from both the front and rear doors. The source-to-substrate distance is variable.
• Pumping options: Cryo, Turbo and Diffusion.