NanoLab Equipment
Equipment Category – Deposition/strong>
CVC-601 Splutterer
Location: Engineering IV Site | Back to Equipment >>
Description: A cryopumped CVC 601 sputter deposition system allows deposition of a variety of metals. Eight-inch sputtering targets are used, allowing batch depositions over 3-inch to 6-inch wafers.
Additional Information
- Hoc Ngo
- hoc@seas.ucla.edu
- 310.206.5528
- Huynh Do
- do.huynh@gmail.com
- 310.206.4641
- Trainings Required 2