NanoLab Equipment
Equipment Category – Etching
Matrix 105 Asher
The Matrix System One Model 105 Asher is a single chamber, automatic microprocessor-controlled photoresist stripper, setup for 4″ – 6″ wafers.
Features
- Model 105
- Configured for up to 6″ wafers
- Single wafer, single cassette
- Independent control of pressure, RF power, temperature, gas flow, & substrate position
- 600W RF water cooled generator
- Multi-step program (three steps + over etch) process program
- “Butterfly” Valve for more precise pressure control.
- Phase magnitude detector to provide real-time RF impedance matching control.
- Two Mass Flow Controllers
- Vacuum Hose Assembly
- Range for Strip: 150C to 250C +/-5C
- Range for Descum: 70C to 150C +/-5C
- Wafer Lift Pin Assembly (up and down)
Additional Information
- Staff Contact
- Hoc Ngo
- hoc@seas.ucla.edu
- 310.206.5528
- Lorna Tokunaga
- lorna@cnsi.ucla.edu
- 310.983.3413
- Wilson Lin
- yousheng@seas.ucla.edu
- 310.206.8923
- Trainings Required: 1