NanoLab Equipment

UCLA Nanolab

Equipment Category – Thermal/Furnace

Oxidation Furnace

Location: Engineering IV Site | Back to Equipment >>

In microfabrication, thermal oxidation is a way to produce a thin layer of oxide on the surface of a wafer. The technique forces an oxidizing agent to diffuse into the wafer at high temperature and react with it. The rate of oxide growth is often predicted by the Deal–Grove model. Thermal oxidation may be applied to different materials, but most commonly involves the oxidation of silicon substrates to produce silicon dioxide.


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