NanoLab Equipment

UCLA Nanolab

Equipment Category –¬†Chemical Processing/Wet Clean & Etch

Prefurnace Clean (PFC) Sink

Location: Engineering IV Site | Back to Equipment >>

This wet bench is used for RCA cleaning of wafers before furnace processes. The RCA clean is a widely-used, 3-stage method of cleaning Si wafers and is effective at removing organic and ionic surface contaminants. The PFC 01/RCA cleaning procedure is required for all wafers prior to being placed in any CMOS-clean furnace (all S1-S5 tubes except for the S1/T1 sintering tube). It is a three-stage cleaning process

Additional Information