NanoLab Equipment

Equipment Category – Lithograpy

Raith EBPG 5000+ES – Electron Beam Writer

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The Raith EBPG 5000+ES electron-beam lithography system provides high resolution, high throughput patterning over small piece to six-inch substrates. The electron-beam tool is fully automated, with a laser-guided substrate stage providing excellent stitching and overlay accuracy. Projects involved in electron beam lithography at UCLA nanolab include research in photonic bandgap engineering, electron transport physics, quantum computing, and more.
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