NanoLab Equipment
Equipment Category – Backend
Tousimis 915B Critical Point Dryer
The Tousimis 915B Critical Point Dryer is a fully automatic, microprocessor controlled, anti-stiction release tool. Liquid Carbon Dioxide (LCO2) is used as the cooling element for surpassing the critical meniscus liquid-vapor states. The chamber of the Supercritical Automegasamdri®915B has a 6.50” internal diameter (ID) chamber, accepting up to 6” diameter wafers for anti-stiction release processing. Therefore, 2’’, 3’’, 4’’, 6” wafers as well as pieces may be dried using the appropriate sample size fixture. The Supercritical Automegasamdri®-915B is equipped with four space-saver Teflon removable spacers and five corresponding wafer/die cartridges which will accommodate up to five wafers each, per process.
Features:
- Clean room static free compatible design
- Microprocessor controller allows for complete automatic processing
- All internal surfaces are inert to CO2 and ultrapure alcohols
- Repeatable operating parameters insuring reproducibility of results
- LED’s instantly indicate process mode at a glance
- Integrated temperature controls
- Processes up to 5 x 6″ diameter wafers per run; comes with additiona HF compatible wafers or 5 x 10 mm square die
Additional Information
- Hunyh Do
- do.huynh@gmail.com
- 310.206.4641
- Joe Zendejas
- zendejas@ucla.edu
- 310.206.5528
- Trainings Required: 1