NanoLab Equipment

Equipment Category – Deposition

Fiji Thermal and Plasma Atomic Layer Deposition

Location: Engineering IV Site | Back to Equipment >>

The Fiji Thermal and Plasma ALD is a modular, high-vacuum ALD sytem that accommodates a wide range of deposition modes using a flexible architecture as well as multiple configurations of precursors and plasma gases. 


  • Provides both plasma and thermal atomic level deposition
  • Intuitive interface to easily monitor and change recipes as needed
  • Applied advanced computational fluid dynamics analyses to optimize Fiji reactor, heater and trap geometry
  • Proprietary Chamber Turbo Pumpking System
  • In-Situ ellipsometry and quartz crytal microbalance
  • Integrated ozone



Additional Information