NanoLab Equipment
Equipment Category – Deposition
Fiji Thermal and Plasma Atomic Layer Deposition
Location: Engineering IV Site | Back to Equipment >>
The Fiji Thermal and Plasma ALD is a modular, high-vacuum ALD sytem that accommodates a wide range of deposition modes using a flexible architecture as well as multiple configurations of precursors and plasma gases.
Features
- Provides both plasma and thermal atomic level deposition
- Intuitive interface to easily monitor and change recipes as needed
- Applied advanced computational fluid dynamics analyses to optimize Fiji reactor, heater and trap geometry
- Proprietary Chamber Turbo Pumpking System
- In-Situ ellipsometry and quartz crytal microbalance
- Integrated ozone
Additional Information
- Staff Contact
- Wilson Lin
- yousheng@seas.ucla.edu
- 310.794.9329
- Bo-Chao Huang
- alanhuang@ucla.edu
- 310.206.8923
- Trainings Required: 2