Equipment Category – Thermal
YES LPIII HMDS Thermal Oven
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The YES Oven can be used to anneal samples up to 450° C in ambient atmosphere, vacuum, or with the user’s choice of 4 background gases. The lowest vacuum achievable under vacuum is approximately 50mT. Processes with background gas normally run between 150-300 Torr. The available gases are: Nitrogen, Oxygen, Argon, Forming Gas (5% Hydrogen in Nitrogen).