NanoLab Equipment
Equipment Category – Thermal
YES LPIII HMDS Thermal Oven
Location: CNSI Site | Back to Equipment >>
The YES Oven can be used to anneal samples up to 450° C in ambient atmosphere, vacuum, or with the user’s choice of 4 background gases. The lowest vacuum achievable under vacuum is approximately 50mT. Processes with background gas normally run between 150-300 Torr. The available gases are: Nitrogen, Oxygen, Argon, Forming Gas (5% Hydrogen in Nitrogen).
Additional Information
- Staff Contact
- Lorna Tokunaga
- lorna@cnsi.ucla.edu
- 310.983.3413
- Joe Zendejas
- zendejas@ucla.edu
- 310.206.5528
- Trainings Required: 1