by kbair | Jan 31, 2020 |
NanoLab Equipment Equipment Category – Lithography Heidelberg DWL 66 Laser Mask Writer Location: Engineering IV Site | Back to Equipment >> Reserve equipment with LabRunr The DWL 66 is the ultimate lithography research tool for Research & Development...
by kbair | Jan 31, 2020 |
NanoLab Equipment UCLA Nanolab Equipment Category – Lithography HF-Buffered Oxide Etch Location: Engineering IV Site | Back to Equipment >> Reserve equipment with LabRunr Buffered oxide etch (BOE), also known as buffered HF or BHF, is a wet etchant used in...
by kbair | Jan 31, 2020 |
Equipment Category – Lithography Karl Stuss MA6 Top and Bottom Side Aligners Location: Engineering IV Site | Back to Equipment >> Reserve equipment with LabRunr Location: CNSI Site | Back to Equipment >> Reserve equipment with labrunr The Karl Suss...
by kbair | Jan 31, 2020 |
NanoLab Equipment Equipment Category – Lithography Porous Silicon Etch Bath Location: Engineering IV Site | Back to Equipment >> Reserve equipment with LabRunr Porous silicon (PS) has gained wide-spread attention over the last decade for its interesting...
by kbair | Jan 31, 2020 |
NanoLab Equipment Equipment Category – Thermal VWR Vacuum Oven Location: Engineering IV Site | Back to Equipment >> Reserve equipment with LabRunr The VWR 1410 Vacuum Oven is a microprocessor controlled oven with a solid outer door and inner door with...
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